Advances in resist materials and processing technology XXVII (22-24 February 2010, San Jose, California, United States)Allen, Robert D; Somervell, Mark Howell.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 2 vol, 2, isbn 978-0-8194-8053-8 0-8194-8053-3Conference Proceedings

Point-of-use filtration methods to reduce defectivityBRAGGIN, J; SCHOLLAERT, W; HOSHIKO, K et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 763918.1-763918.9, 2Conference Paper

Orthogonal lithography for organic electronicsTAYLOR, Priscilla G; LEE, Jin-Kyun; ZAKHIDOV, Alexander A et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76390Z.1-76390Z.8, 2Conference Paper

Comparison of star and linear ArF resistsFORMAN, Drew C; WIEBERGER, Florian; GROESCHEL, Andre et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76390P.1-76390P.8, 2Conference Paper

Photobase Generator Assisted Pitch DivisionXINYU GU; BATES, Christopher M; WILLSON, C. Grant et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 763906.1-763906.12, 2Conference Paper

Polymer Photochemistry at the EUV WavelengthFEDYNYSHYN, Theodore H; GOODMAN, Russell B; CABRAL, Alberto et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76390A.1-76390A.12, 2Conference Paper

Characterization of the Effects of Base Additives on a Fullerene Chemically Amplified ResistMANYAM, J; MANICKAM, M; PREECE, J. A et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76391N.1-76391N.8, 2Conference Paper

Dependence of 20 nm C/H CD Windows on Critical Process ParametersCHEN, Wei-Su; GU, Pei-Yi; TSAI, Ming-Jinn et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76390Y.1-76390Y.12, 2Conference Paper

EUV RLS Performance Tradeoffs for a Polymer Bound PAG ResistGRONHEID, Roel; VAGLIO PRET, Alessandro; RATHSACK, Benjamen et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76390M.1-76390M.9, 2Conference Paper

High resolution positive-working molecular resist attached with alicyclic acid-leaving groupYAMADA, Arisa; HATTORI, Shigeki; SAITO, Satoshi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76390S.1-76390S.11, 2Conference Paper

Negative-tone Chemically Amplified Molecular Resist based on Novel Fullerene Derivative for NanolithographyYAMAMOTO, Hiroki; KOZAWA, Takahiro; TAGAWA, Seiichi et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76390U.1-76390U.8, 2Conference Paper

Photobase generator and photo decomposable quencher for high-resolution photoresist applicationsWANG, C. W; CHANG, C. Y; KU, Y et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76390W.1-76390W.15, 2Conference Paper

The Important Challenge to Extend Spacer DP process towards 22nm and beyondOYAMA, Kenichi; NISIMURA, Eiichi; YAMAJI, Tomohito et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 763907.1-763907.6, 2Conference Paper

Defect performance of a 2X node resist with a revolutionary point-of-use filterBRAGGIN, J; RAMIREZ, R; WU, A et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76391E.1-76391E.8, 2Conference Paper

Development of EUV resists based on various new materialsOIZUMI, Hiroaki; MATSUMARO, Kazuyuki; SANTILLAN, Julius et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76390R.1-76390R.8, 2Conference Paper

Dynamics of Radical Cation of Poly(4-hydroxystyrene) Generated in Thin Film upon Exposure to Electron BeamNATSUDA, Kenichiro; KOZAWA, Takahiro; OKAMOTO, Kazumasa et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76391K.1-76391K.9, 2Conference Paper

New self-assembly strategies for next generation lithographySCHWARTZ, Evan L; BOSWORTH, Joan K; PAIK, Marvin Y et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76390G.1-76390G.11, 2Conference Paper

Study on approaches for improvement of EUV-resist sensitivityTARUTANI, Shinji; TSUBAKI, Hideaki; TAKAHASHI, Hidenori et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 763909.1-763909.8, 2Conference Paper

The Evolution of Patterning Process Models in Computational LithographySTURTEVANT, John L.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 763902.1-763902.13, 2Conference Paper

The Imaging Study of a Novel Photopolymer Used in I-line Negative-tone resistLIU LU; ZOU YINGQUAN.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76391B.1-76391B.6, 2Conference Paper

The optimizations of resist shrink process using track-based technologyKONDO, Yoshihiro; OOKOUCHI, Atsushi; TSURUDA, Toyohisa et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76390X.1-76390X.8, 2Conference Paper

Advantages of BARC and photoresist matching for 193-nm photosensitive BARC applicationsLOWES, Joyce; PHAM, Victor; MEADOR, Jim et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76390K.1-76390K.11, 2Conference Paper

Alternatives to Chemical Amplification for 193 nm LithographyBAYLAV, Burak; MENG ZHAO; RAN YIN et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 763915.1-763915.12, 2Conference Paper

Analysis of Trade-off Relationships in Resist Patterns Delineated using SFET of SeleteKOZAWA, Takahiro; OIZUMI, Hiroaki; ITANI, Toshiro et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76390B.1-76390B.7, 2Conference Paper

Development of an inorganic photoresist for DUV, EUV, and electron beam imagingTRIKERIOTIS, Markos; WOO JIN BAE; SCHWARTZ, Evan et al.Proceedings of SPIE, the International Society for Optical Engineering. 2010, Vol 7639, issn 0277-786X, isbn 978-0-8194-8053-8 0-8194-8053-3, 76390E.1-76390E.10, 2Conference Paper